The WS (Wet Station) series is a state-of-the-art, cost-effective wafer processing system solution capable of processing up to 50 wafers in a batch, with multiple tanks suitable for a wide range of chemistries. It supports traditional wet processes such as pre-film clean, etch, post-etch clean, and photoresist stripping. Newly developed features enable batch processing with a smaller footprint, superior productivity, and exceptional cleaning results.